For more information, contact:
Jim Donaldson Advanced Energy Industries, Inc. 970.407.6374
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Marna Shillman Advanced Energy Industries, Inc. 970.407.6280 marna.shillman@aei.com |
Copper Plating Pulsed DC Power Supply now Available from Advanced Energy
August 6, 1999—The E-Wave bi-polar pulsed dc power supply for the copper plating phase of dual-damascene process flow (DDPF) applications is now available from Advanced Energy Industries, Inc. (Nasdaq: AEIS). The compact E-Wave supply has four, independently-controlled pulsed dc channels with versatile waveform construction. Each channel stores 15 waveforms as well as 15 recipes. The supply features host computer control which allows waveforms to be changed on the fly, four-terminal control and measurement of voltage at the wafer, and high current capability.
- Higher yields: better film property control; evens out PVD non-uniformities
- Lower cost of ownership: reduces additive consumption; saves clean-room space
- More devices per wafer: smaller feature size
- Greater throughput: higher current for faster bulk fill
- Process flexibility and optimization: versatile waveform and host control
- Process repeatability: four-terminal control allows placement of the supply away from the copper bath; small size allows placement next to the bath
- Expandable to 300 mm applications: higher current capability