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Redundant Anode Sputtering White Paper Released By Advanced Energy

This paper describes a new method of sputtering an insulating material on a substrate. This method offers numerous advantages over previous techniques such as dual magnetron sputtering. The new approach uses a single target, the surface of which is kept free from unwanted charging and resultant arcing using alternating power. The system also does not suffer from the "disappearing anode" effect and can be operated continuously in a production environment. This is accomplished through use of an ac power supply and a novel anode and circuit configuration that uses the plasma itself as a rectifier to convert the applied alternating power to dc power for the single cathode. The system is described in detail and preliminary experimental results are presented.

Copies of this paper are available at no charge by sending a request via e-mail to sales.support@aei.com or from the web at advanced-energy.com.

Advanced Energy is a global leader in the development, marketing, and support of integrated technology solutions that are central in the manufacture of semiconductors, data storage products, and flat panel displays as well as other mission-critical power applications. Original equipment manufacturers and end- users around the world depend on AE products when plasma-based technology plays a vital role in their manufacturing process. AE offers a comprehensive suite of key subsystems for vacuum process systems including power conversion and control solutions, process monitoring and machine control tools, ion-beam sources, dynamic temperature control and measurement products, and plasma abatement technologies. AE technology solutions are sold and supported globally by direct offices, representatives, and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq under the symbol AEIS.