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AE to Showcase Field-Proven Xstream™ Remote Plasma Source at SEMICON Europa 2004

AE to introduce Aera^® Transformer™ multi-gas, multi-range digital MFC and Litmas™ remote plasma abatement source

FORT COLLINS, Colo., April 14, 2004—Advanced Energy Industries, Inc. (Nasdaq: AEIS) today announced that it will showcase its high-performance Xstream™ remote plasma source with Active Matching Network™ during SEMICON Europa 2004. AE also will feature its new Litmas™ remote plasma source for semiconductor perfluorinated compound (PFC) abatement; its new Aera^® Transformer™ multi-gas, multi-range (MGMR) digital mass flow controller (MFC) series; and the field-proven Pinnacle^® Plus+ at the exposition, being held April 20-22 at the New Munich Trade Fair Centre in Germany. The newest offerings from AE are designed to give OEMs and end users the solutions to help optimize their semiconductor manufacturing processes.

Xstream Remote Plasma Source with Active Matching Network™
The Xstream™ platform provides users with unsurpassed flexibility in their reactive-gas processes, improving system throughput and optimizing the use of expensive resources. This is accomplished by integrating a remote plasma source, a 8 kW or 6 kW high-efficiency power supply and a patented solid-state active matching network, which accommodates the widest impedance operating range commercially available in a chamber-clean source. The platform generates active, neutral chemical species from stable feed gases for surface modification, chamber cleaning, thin-film etch and plasma-assisted deposition.

New Aera^® Transformer™ Multi-Gas, Multi-Range Digital MFC
The versatile Transformer™ multi-gas, multi-range (MGMR) MFC platform dramatically reduces spares inventories, which can create a substantially lower total cost of ownership (CoO). This inherently flexible platform provides unmatched field programmability to run any gas for any gas flow range—from 10 sccm to up to 30 slm. As few as eight different Transformer MFC models can be used to support a fab’s requirements. These MFCs allow unlimited gas selection without recalibration, and they can be pulled directly from a customer’s inventory shelf and easily programmed to meet the application requirements.

New Litmas™ RPS Linear-Inductive Plasma Source
The Litmas RPS 1501 and RPS 3001 are high-density RF plasma sources for abatement of perfluorinated compound (PFC) emissions in semiconductor etch processes. These next-generation linear-inductive plasma sources deliver a number of benefits over competitive atmospheric-pressure plasma and combustion-based PFC abatement offerings. Most notably, these sources offer integrated, energy-efficient RF power delivery to advanced cylindrical plasma chambers for cost-efficient foreline abatement of PFC gases.

The Pinnacle^® Plus+ Pulsed-DC Power Delivery System
This well-know platform enables reactive sputtering of insulative films with very high quality and throughput cost-effectively. This platform is ideal for extending the performance of existing processes and expanding the possibilities for developing new, previously unachievable DC processes. The systems are available in single- and dual-output 5 kW and single-output 10 kW configurations with individually controllable dual-output pulsed-DC power.

AE also will be featuring its innovative, reactive-sputtering closed-loop control technology, as well as its other lines of field-proven solutions used in semiconductor manufacturing—including power systems, flow management, source technology and thermal instrumentation.

About Advanced Energy
Advanced Energy is a global leader in the development and support of technologies critical to high-technology manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass and other advanced pr