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Advanced Energy’s Xstream™ Remote Plasma Source with Active Matching Network™ Named One of MICRO Magazine's “Greatest Hits of 2003”
Xstream source provides unsurpassed process flexibility, system throughput and cost efficiency
FORT COLLINS, Colo., March 9, 2004—Advanced Energy Industries (Nasdaq: AEIS) today announced that its Xstream™ remote plasma source with Active Matching Network™ has been named one of MICRO Magazine’s “Greatest Hits of 2003.” This designation, from one of the industry’s most respected publications, resulted from a critical evaluation by the magazine’s editorial staff of all 2003 new product announcements in the semiconductor and advanced microelectronics supply chain.