For more information, contact:

Jim Donaldson Advanced Energy Industries, Inc. 970.407.6374

Marna Shillman Advanced Energy Industries, Inc. 970.407.6280 marna.shillman@aei.com

AE Showcases Xstream™ Remote Plasma Source at SEMICON West

SAN FRANCISCO, Calif., July 14, 2003—Advanced Energy Industries, Inc. (Nasdaq: AEIS) will showcase its new Xstream™ Remote Plasma Source Platform with Active Matching Network™ as well as its Aera^® FC-PA780 mass flow controller (MFC) series and the Apex™ Power Delivery System this week during SEMICON West at San Francisco’s Moscone Center.

 

Introduced just last month, the high-efficiency Xstream platform, mounted outside the process chamber, generates active, neutral chemical species from stable feed gases for surface modification, chamber cleaning, thin-film etch and plasma-assisted deposition. The Xstream platform integrates a remote plasma source, a 6 kW or 8 kW high-efficiency power supply and a patented solid-state active matching network, which accommodates the widest impedance operating range commercially available in a chamber-clean source. The Xstream platform gives users unsurpassed flexibility in their reactive gas processes, thus improving system throughput and optimizing the use of expensive resources. Also showcased this year in AE’s booth #2202 will be the Aera FC-PA780 series of mass flow controllers (MFCs), which offers a low-cost, multi-gas, digital MFC solution for various semiconductor manufacturing applications, including CVD, PVD and etch. Designed with a new valve and sensor, which improves accuracy, reliability and thermal response, the FC-PA780 series delivers ±1% of set point accuracy, >25% of full-scale flow and <0.5% zero drift per year.

In addition, AE will feature its Apex Power Delivery System, which provides high power density, highly accurate power delivery and increased reliability over other RF generator/match configurations currently available. The Apex Delivery System utilizes a built-in, configurable, fixed-match network, which enables users to reduce overall parts count and to locate their power source close to the process chamber. Also exhibited at the show will be AE’s field-proven lines of critical products used in semiconductor manufacturing processes, including power systems, flow management, source technology and thermal management.

About Advanced Energy
Advanced Energy is a global leader in the development and support of technologies critical to high-technology manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass, and other advanced product applications.

Leveraging a diverse product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity and lower cost of ownership for its customers. This portfolio includes a comprehensive line of technology solutions in power, flow and thermal management, plasma and ion beam sources, and integrated process monitoring and control for original equipment manufacturers (OEMs) and end-users around the world.

AE operates in regional centers in North America, Asia and Europe and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq National Market under the symbol AEIS. For more information, please visit our corporate Website: www.advanced-energy.com