For more information, contact:
Joe Monkowski Advanced Energy Industries, Inc. 970.407.6252
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Marna Shillman Advanced Energy Industries, Inc. 970.407.6280 marna.shillman@aei.com |
Industrial, Low Maintenance Ion-Beam Sources now Available from Advanced Energy
June 9, 1999—A new generation of ion-beam sources with industrial, low maintenance, high yield functions has been introduced by Advanced Energy Industries, Inc. (Nasdaq: AEIS). Advantages to end users include improved process performance, quality, and cost of ownership over previous source technologies. The product line includes multi-cell sources (for rotating and stationary substrates) and linear sources (for in-line systems).
- No filaments or hollow cathodes
- No grids or ion optics
- Reactive gas compatible
- Industrial, low maintenance design
- Field proven dc power supply
- Easily retrofittable
- In situ pre-clean and etch with inert gases (e.g., Ar) and reactive gases (e.g., O2) as well as chemically-assisted in situ etch
- Direct deposition of films and overcoats using precursors (e.g., hydrocarbons and metalorganic compounds)
- Assisted deposition for optical, R&D, and semiconductor processes which use low-pressure deposition sources, lasers, or electron beams